Obducat offers Electron Beam Recorders (EBR) for lithographic mastering on rotating substrate with a resolution down to 10nm, based on the EBR 200 platform. The system produces a Gaussian beam spot down to 2nm. This together with the high-speed beam blanker, the high precision linear stage and rotation spindle makes it possible to pattern substrates with e.g. spiral and concentric patterns at short exposure time. Our system supports a number of existing and future formats for optical as well as magnetic media industries. The encoder provides full flexibility to adjust the design of any media format within the specification.
Application areas:
For more information please contact Obducat Sales
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