The Eitre® Nano Imprint Lithography (NIL) series offer a flexible and cost efficient lithography solution. The systems are suitable for Research & Development purposes allowing replication of patterns in the micro- and nanometer range.
Eitre® offers a complete range of imprint methods, including thermal NIL, hot embossing, UV NIL, as well as Obducat's proprietary Simultanous Thermal and UV (STU®) imprint process.
All Nano Imprint Lithography (NIL) systems from Obducat are equipped with full area thermal imprint, using the patented Soft Press® technology. The proprietary design of the heater, embedded in the substrate chuck, provides a homogeneous temperature distribution across the whole imprint area. The uniform heating and a wide range of temperature settings, makes it possible to use a wide range of imprint polymer.
Read more about Obducat proprietary technologies:
Soft Press®
STU®
IPS®
|
