Photovoltaics - PV
Obducat’s NIL technology is well adapted for PV production. Nano Imprint Lithography (NIL) enables a cost-efficient approach to enhancing the efficiency of Photovoltaic solar cells by controlled surface structuring. Three examples of controlled surface structuring are:
Photonic crystal structures that increase light harvesting in solar cells, which in turn minimize reflection of sunlight, increase incidant angle and are wave length independent.
Periodic patterning of PN-junction for increased power conversion efficiency, which improves efficiency by up to 30-50%.
Internal reflection in thin-film solar cell is improved by surface structuring, which in turn minimizes light escape in the cell, increase internal light reflection and light path in the cell.
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