Obducat drives the development and industrialisation of nanotechnology
Nanotechnology is coming closer to our everyday life. New curing medicines, spot-resistant clothes, electronic devices are just a few examples of products in change towards a cleaner and energy saving environment.
Nano Imprint Lithography (NIL) is an efficient and low-cost method of fabricating nano-scale patterns, which includes more information on less space. For example, a sphere with the diameter of one nanometre is in the same proportion to a pinhead as a metre to 1000 kilometres.
Obducat offers a flexible and cost-efficient solution for a wide range of applications, such as production of LEDs, displays, bio-devices etc. A strong product portfolio, from master stamp production to scanning electron microsopes as well as expertise in process know-how, makes Obducat the most competitive supplier on the Nano Imprint Lithography (NIL) market.
Obducat's NIL technology is a user-friendly imprint system for industrial high volume manufacturing and product development as well as research and development in academia. The technology enables replication of extremely accurate micro and nanoscale structures from a master to a polymer film. The polymer film is in turn replicated and transferred to the final substrate. The entire surface is replicated in one single process step, a patented technique which decreases poduction cost. Other advantages with the Obducat technology is elimination of thermal expansion effects and reduction of particles, thanks to the STU® process and the IPS®.
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